4N-6N purity aluminum target, copper target, titanium aluminum target copper target titanium target target manufacturers

Beijing crown Jinli New Material Technology Co., Ltd. for your target and related supply high purity aluminum coated products, including: 1, high purity aluminum target: The company supplies suited for glow discharge sputtering, RF sputtering glow, magnetron sputtering, ion beam sputtering, ion plating of high purity aluminum target. 2, high purity aluminum target: 99.9%, 99.99%, 99.999%, 99.9999%. 3, high purity aluminum target specifications:? (1) planar targets such as 100 * 5mm flat round of high-purity aluminum target, 150 * 100 * 3 flat panel high-purity aluminum targets, (2) magnetron sputtering with high purity aluminum Target:? 100 * 120 columns target and so on. 4, high purity target materials production process: vacuum melting, melt casting, powder metallurgy, hot, cold (hot) isostatic pressing. 5, high purity aluminum target processing: turning, milling, and so on. 6, introduce high purity aluminum targets related parameters: Appearance: Silver density: 2.70 g / cm3 Melting point: 660 ℃ Boiling point: 2463 Beijing crown Jinli New Material Technology Co., Ltd. Long-term supply of high titanium and high titanium target, high purity titanium target, purity of 99.9% -99.999%, the company specializes in the production of metal coating materials, titanium target is one of our main targets, mainly for the sputtering, major research institutes and universities experiment. Related introduce high titanium target is as follows: 1, high purity titanium target of 99.5%, 99.9%, 99.99%, 99.999%. 2, flat high titanium target Specification:? 100 * 40 76.2 * 6,100 * 400 * 10 and so on?. 3, cylindrical high titanium target: 100 * 80,125 * 63 and so on. 4, high pure titanium target size specifications can be customized according to customer requirements, in accordance with drawings. 5, high-titanium target production process: vacuum melting, melt casting, powder metallurgy, hot, cold (hot) isostatic pressing technology. 6, deposition of high titanium wire:? 0.2-3. 7, evaporated titanium particles with high: 6 * 6,2 * 10,3 * 3 and so on. Beijing crown Jinli New Material Technology Co., Ltd. for your long-term supply of high-copper, high copper target, high copper target, copper target and related products, as follows: 1, high copper target: Print target common specifications such as round copper plate target target 76.2 * 5:? 400 * 100 * 10, 2, rotating column of high copper target magnetron target, such as 65 * 80 and so on?. 3, high purity copper target was 99.95% -99.9999%. 4, high pure copper target products through a variety of methods (sputtering, vacuum plating, etc.) vacuum coating applications in various fields: scientific research, aerospace, automotive, microelectronics, IC industry, light source, optical, decorative, flat panel display industry, the information storage industry, data storage, and so on. 5, a variety of sizes can be customized according to customer requirements, but also may be drawing processing.