Crown Jinli purity silicon target, high-purity silicon target, target high-purity silicon oxide, silicon oxide target, ..

Beijing crown Jinli New Material Technology Co., Ltd. Long-term supply of high-purity silica for your target, target high-purity silica and high purity silica target related products as follows: 1, high purity silica target The purity: 99.9%, 99.99%, 99.999%. 2, high purity silica target specifications are:? Flat silicon dioxide target, the target circle as 76.2 * 4 and so on and so on. 3, high purity silica particles: 1-3mm, 3-5mm, and so on. 4, high-purity silica powder: -200 mesh -2000 mesh and so on. High purity silica relevant parameters are as follows: Formula: SiO2 Appearance: colorless transparent 5, molecular weight: 60.06 Density: 2.2g / cm3 Melting point: 1730 ℃ Steam pressure: at 2000 ℃ when 1 Pa 10 Pa when a linear expansion at 2200 ℃ coefficient: 0.5 × 10-6 / K (293 ~ 1173K) specific heat: 0.201 Cal / gK thermal conductivity: 0.00285 Cal / k.cm.S (287K) Hardness (Mohs): 5.5 (Clinton) 461 Kg / mm2 transparent band: a refractive index of 0.2 to 9 (λ = 550nm): 1.46 6, evaporation: evaporation with an electron gun. Evaporation temperature: 1700 ℃ evaporating pressure: ~ 5 × 10-3 Pa Applications: antireflection film, multilayer film, filters, beam splitter, film capacitor 7, all of the above target high-purity silica particles, powder can be customized according to customer requirements, in accordance with drawings, if in doubt, please contact us! Beijing crown Jinli New Material Technology Co., Ltd. for your long-term supply of high-purity silicon target, high-purity silicon sputtering targets, high purity silicon-related products, as follows: 1, the purity of high-purity silicon target of 99.9%, 99.99%, 99.999%, 99.9999% etc. 2, high-purity silicon wafers, high purity polycrystalline silicon films. Common size 170 * 85.5 * 9 and so on. 3, common specifications of high-purity silicon target: Board Target: 70 * 25.9 * 6 and the like. 4, high-purity silicon powder: -200-500 mesh, -325 mesh, and so on. 5, high-purity silicon granules: 1-5mm, 200 #, 5-10mm etc. 6, high-purity single-crystal silicon target, target high-purity polysilicon. 7, the relevant parameters: density: 2.42 Melting point: 1410 refractive index: 3.42. 8, other high-purity product Beijing crown Jinli New Material Technology Co., Ltd.: a variety of high-purity metal target, alloy target, ceramic targets, coating materials. Metal targets: aluminum target Al, silver target Ag, cobalt target Co, Cr target Cr, copper target Cu, Ni target Ni, Ti target Ti, Zn target Zn, Mg target Mg, Nb target Nb, Sn target Sn, indium target. In, iron target Fe, aluminum zirconium target Zr, Ti and Al Targets Ti, Zr target Zr, tantalum target Ta, germanium target Ge, Si target Si, tungsten target W, hafnium target Hf, gadolinium target Gd, Sm target Sm, Dy target Dy, target cerium Ce, yttrium target Y, lanthanum La alloy target and Au target. Alloy Target: titanium-aluminum Ti-Al, Al-Si Al-Si, Al-Cu Al-Cu, Al-Ti-Al-Ti, silver and copper Ag-Cu, Al-Mg Al-Mg, cobalt-iron-boron Co-Fe-B, copper indium gallium Cu-In-Ga, Fe, Mn, Fe-Mn, indium tin In-Sn, cobalt iron Co-Fe, Ni-Co Ni-Co, Ni-Fe Ni-Fe, Ni-Cr Ni-Cr, Ni-Zr Ni-Zr, nickel-aluminum Ni-Al, Ni-Cu Ni-Cu, nickel and vanadium Ni-V, titanium tungsten W-Ti, Zn-Al Zn-Al, Al-Ti-B Al-Ti-B, Al-Sc Al-Sc, vanadium aluminum V-Al iron V-Al-Fe, copper and tin Cu-Sn, aluminum zirconium Zr-Al, vanadium aluminum V-Al, B-Fe and other iron-boron. Ceramic target ITO target, target magnesia, iron oxide target, a target of silicon nitride, silicon carbide target, a target of titanium nitride, chromium oxide target, a target of zinc oxide, zinc sulfide target, silicon dioxide target, a silicon oxide target, cerium oxide target, the target zirconia, niobium pentoxide target, a target of titanium dioxide, zirconium dioxide, hafnium dioxide target ,, target, target titanium diboride, zirconium diboride target, target tungsten trioxide, aluminum oxide target, tantalum pentoxide, niobium pentoxide target, magnesium fluoride target, target yttrium fluoride, zinc selenide target, a target of aluminum nitride, silicon nitride target, the target boron, titanium nitride target, silicon carbide target, lithium niobate target, target praseodymium titanate, barium titanate target, target lanthanum titanate, nickel oxide target, and other ceramic target. Various fields of products through a variety of methods (sputtering, vacuum plating, etc.) vacuum coating applications: scientific research, aerospace, automotive, microelectronics, IC industry, light source, optical, decorative, flat panel display industry, the information storage industry, data storage, and so on. Note All product specifications can be customized according to customer requirements.