Photographic developer can pack ink: XR-3600

 Summer Ice Shenzhen Electronic Technology Co., Ltd SHEN ZHEN SUMMER ELECTRONIC MATERIAL.LTD developing photosensitive etching resist ink (XR-3600) XR-3600 is the introduction of Japanese technology, developed by a German import materials. One-component UV contact exposure, alkali development, etch resistance, anti-plating, oxidation of high-grade developing photosensitive etching resist ink. Widely used in high-precision etching electronic hardware components, ultra-thin high-precision optical components, flower roll, stainless steel mesh. Having a stacked plate placed imaging and high etch resistance ability, lateral erosion is minimal, stable performance characteristics. Also for the production of single-sided, double-sided and multi-layer circuit board precision. Acid etching solution and corrosion of copper, tin, lead and nickel gold plating solution, its performance is more excellent than dry. Operating procedures and technical parameters: a front substrate treatment acid treatment and brushing with the same pre-treatment generally applied to pre-dry screen printing, spraying or roll coating method. Thickness: Etching 8 ~ 15um; plating 15 ~ 20um exposure 70 ~ 90 ℃, 5-15 minutes, cooled flip pressure no indentation. 80-120mj / cm, 21 light ladder Table 7-10 cells (1-5kw UV light, iodine gallium lamp, a mercury lamp developing 15-40 seconds), electroplating 120-160 mj / cm. 0.8 to 1.2% sodium carbonate (Na2CO3) solution, 30 ± 2 ℃ solution of 40-60 seconds. After baking etching 140-170 ℃, bake for 20-30 minutes. Acidic or alkaline etching solution. To film a 5% sodium hydroxide (NaOH) solution, 50 ± 5 ℃, 60-120sec.