Photographic developing anti-blast drawing ink XR-9009

 Shenzhen Great Electronics Materials Co., Ltd. SHEN ZHEN SUMMER ELECTRONIC MATERIAL.LTD photographic developing anti-blast (drawing) Ink (XR-9000) XR-9000 is the introduction of Japanese technology developed for the one-component UV contact exposure, alkali development. Anti-sandblasting, etching resist, anti-plating ink. Widely used in metal utensils, molds, flower roll, crafts, plate, stainless steel mesh, pattern sandblasting electronic hardware components, high-precision etching and electroplating. Developing high. Anti-sandblasting, etching resist, plating resist ability, stable performance. Also for the production of single-sided, double-sided and multi-layer circuit board precision. Operating procedures and technical parameters: a front substrate treatment acid treatment and brushing with the same general pretreatment coating Stir full printing or spraying. Thickness: 1 sand: 15-30um; 2 plating 120-150 mesh, 3 etching 200-250 mesh screen, allowed to stand for 15 minutes after printing. Pre-dry 75 ℃ -85 ℃, 10-20 minutes, cooled flip pressure no indentation. Exposure 80-100mj / cm, 21 light ladder Table 6-8 grid (1-3kw ultraviolet lamp, iodine gallium lamp, mercury 40-50 seconds), plating 100-120 mj / cm. Developing at a concentration of 1-1.2%, temperature 30 ± 2 ℃ of sodium carbonate (Na2CO3) solution soak for 40-45 seconds, then rinse 1.5-2.0kg / cm pressure. After baking 120-140 ℃, bake 10-20 minutes. Process Manufacturing 1: Anti-blast: Hand gun and blasting vertical distance of 15 to 20 cm. 2: etching resist: acidic or alkaline etching solution. 3: Anti-plating: The resistance of copper, tin, lead, nickel, gold plating solution. To film a 5% sodium hydroxide (NaOH) solution, 50 ± 5 ℃, 60-120sec.