CVD vapor deposition furnace

Chemical vapor deposition furnace applications Chemical vapor deposition furnace (carbon deposits) can be used for chemical vapor deposition of hydrocarbon gas (C3H8, etc.) as carbon composite material, such as CVD C / C composites, SiC composites, etc., CVI process. Chemical vapor deposition furnace Product type / size W × H × L (mm) 600 * 600 * 1000 800 * 800 * 1200 1000 * 1000 * 1500 1200 * 1200 * 2500 1500 * 1500 * 3000 2500 * 2000 * 3600 loaded weight (KG) 350 800 1500 2500 5000 10000 maximum temperature (℃) 1500 1500 1500 1500 1500 1500 temperature uniformity (℃) ± 7.5 ± 7.5 ± 7.5 ± 10 ± 10 ± 15 heating power (kw) 250 360 480 600 900 1200 Limit the degree of vacuum (Pa) 20 20 20 20 20 20 Pressure rising rate (Pa / h) 0.67 0.67 0.67 0.67 0.67 0.67 or more chemical vapor deposition furnace parameters can be adjusted according to process requirements, not as a basis for acceptance, the specific technical solutions and agreements Quasi. Chemical vapor deposition furnace main door configuration ??: // screw lift hydraulic lift / manual lifting; manual locking / automatic locking collar lock ?? furnace shell: Full Carbon / inner stainless steel / stainless steel furnace ?? : soft carbon felt / soft graphite felt / hard composite carpet / CFC ?? heater: isostatic graphite / molded three high graphite / fine grain graphite ?? process gas system: Volume / mass flowmeter; manual valve / automatic valve; import / domestic ?? pumps and vacuum gauge --- import / domestic ?? PLC: Omron / Siemens ?? temperature control: Japanese island / UK Continental ?? thermocouple: C indexing number / S sub-degree numbers / K sub-degree / N indexing number ?? Recorder: paperless recorder / paper records; import / domestic ?? HMI: simulation screen / touch screen / IPC ?? electrical components: Chint / Schneider / Siemens ?? skip: Raceway / forklift / stacking long transmission skip a chemical vapor deposition furnace technical characteristics of the chemical vapor deposition furnace ?? maximum workspace size up to 2.5m × 2m × 4.5m, to meet the ultra- large parts of the chemical vapor deposition processing requirements; ?? The chemical vapor deposition furnace using multi-temperature-zone temperature control, temperature uniformity; ?? The chemical vapor deposition furnace deposition chamber with special structure, good sealing effect, strong anti-pollution; ?? The chemical vapor deposition furnace using multichannel deposition gas line, flow field uniformity, no deposition of dead ends, good deposition results; ?? The chemical vapor deposition furnace tar, solid dust, organic carbon deposition gas generated in the process can be performed effectively addressed.