Powder plasma processing system

Product Name Powder plasma processing system Model GDR-1200F Category powder plasma processing system >> Features Powder plasma processing system, touch computer + PLC automatic control multi-step process, the whole circuit detects, for a variety of powder surface activation and hydrophilic, water repellent graft treatment, alternative to chemical treatment applied to paint, chemical, magnetic materials, electronics and semiconductor industries. >> Technical parameters ◆ Dimensions (processing unit) 2100 (W) × 1200 (D) × 2050 (H) mm ◆ warehouse structure (stainless steel, about 1,200 liters, cone) 1000 (W) × 1200 (H) mm ◆ batch processing of materials by weight: 100KG ◆ plasma generator (USA MKS) frequency 13.56MHZ, power 0-1250W continuous adjustment, automatic impedance matching, whole circuit protection, continuous work ◆ time control system touch computer + PLC automatic control, Omron, Siemens and other world famous brands electrical components, stable and reliable performance, and with manual and automatic modes ◆ vacuum system (vacuum pressure PID closed-loop automatic control) Edward (Edwards) claw dry pump GV160 (40L / S ) Edward Roots pump EH1000 (280L / S) Taiwan pneumatic vacuum angle valve, fill valve, DN63 stainless steel vacuum bellows, precision German INFICON vacuum gauges, sensors ◆ US inflation system MKS precision electronic mass flow meter (two Road gas preparation), needle US Swagelok gas pipeline and interface components, the German two-stage valve Japan SMC and CKD high vacuum valve assembly