Magnetron sputtering vacuum evaporation complex vacuum coating equipment

This device utilizes magnetron sputtering cathode glow discharge atomic (target) is deposited on the substrate ionization (physical vapor deposition PVD) and vacuum resistance heating method wire melted or vaporized metal molecule on the substrate, phone shell and other plastic surface metallization, using a specific non-conductive thin film coatings to achieve product and electromagnetic shielding effect, in order to meet the current high-end mobile phones and electronic products manufacturing industry standards; concentrated plasma processing equipment, high-cathode magnetron sputtering, resistance evaporation coating equipment, large loading capacity turret and automatic control technology, reliable, reproducible and good consistency, fast deposition rate, good adhesion, film and other fine quality, high-density plating film hardness, low coefficient of friction, It can maintain the original surface finish, with good toughness, not easy to break off. Equipment to achieve fully automated coating process control. Surface of the substrate into the coating by vacuum deposition method, with low production costs, high qualified products, green and so on, mainly used in computers, mobile phones, high-end industrial (home) electronics, aerospace and other fields, can be plated composite a metal film, alloy film, a transparent (translucent) film, a non-conductive film, electromagnetic shielding film and a special film and the like. The company can according to user requirements and design of various models of vacuum coating machines. Vacuum unit and electric control system can also be configured according to user requirements design.